FABRICATION OF MICRO AND NANO PILLAR ARRAYSBY DIELECTROPHORESIS FORCE DRIVEN REVERSE-IMPRINT
In this study, micro/nano poly-pillar arrays are fabricated by dielecphoretic-force-drivcn-filling reverse-imprint method.In this method, a conducive mold is dipped into a pool of pre-polymer, which is dropped onto a conductive substrate, and a voltage is applied between the mold and the substrate.The liquid-dielectrophoresis (L-DEP) force can be generated by the applied voltage to drive pre-polymer filling into cavities of the mold.After the filling process is completed, the mold with pre-polymer in its cavities is moved out off the pre-polymer pool and put onto a target substrate.Then the pre-polymer is cured the by UV-light irradiation and subsequently the mold is removed from the target substrate to obtain the poly-pillar arrays on the target.Using this technique, micro/nano poly-pillar arrays with high aspect ratio (more than 10:1) are duplicated.This patterning method can overcome the drawbacks of the mechanically induced mold deformation and position shift in conventional imprinting lithography.
liquid-dielectrophoresis force high aspect ratio micro/nano pillar array reverse-imprint
XIANGMING LI JINYOU SHAO YUCHENG DING HONGZHONG LIU
State Key Laboratory for Manufacturing Systems Engineering,Xian Jiaotong University,Xian,Shaanxi 710049,Peoples Republic of China
国际会议
3rd International Conference on Mechanical and Electrical Technology(ICMET2011) (2011第三届机械与电气技术国际会议)
大连
英文
455-459
2011-08-26（万方平台首次上网日期，不代表论文的发表时间）