Based on hot embossing Lithography Preparation of high-precision micron-levelpattern

摘要：

Being the first to be used in nano-imprint lithography, hot embossing technology is one kind of it, and it can have access to copying the parallel structure in micro-nano-scale at low cost and relatively faster speed. This paper explores which factors influence some pattern transferring accuracy appearing in the experiment. The parameters affecting the accuracy of pattern transfer are optimized via the lntelliSuite simulation designed specifically for MEMS. A micro-level pattern with high-precision by the use of nano-imprint Obduct machine is eventually made.

关键词： hot embossing lithography MEMS micro-scale patter

作者: Sumei Jia Ruixia Yang Hongjun Guo Huaibo Qu Peng Gao

作者单位: College of Information Engineering, Handan College, Handan, China College of Information Engineerin College of Information Engineering, He bei University of Technology, Tianjin, China College of Information Engineering, Handan College, Handan, China School of Electronic and Information Engineering, Tianjin University, Tianjin, China

会议类型: 国际会议

会议名称: 2011 3rd International Conference on Computer and Network Technology(ICCNT 2011)(2011第三届IEEE计算机与网络技术国际会议)

会议地点: 太原

会议语种:英文

页码: 380-383

在线出版日期: 2011-02-26（万方平台首次上网日期，不代表论文的发表时间）