会议专题

Demonstration of modification from AIF3 re-deposition to polymer re-deposition on Air Bearing Surface (ABS) Etched Sidewall of Fluorine-Based Plasma Etch on AI2O3-TiC Substrate

In this work, C-F polymer rich re-deposition are generated on the etched side wall of the patterned Air Bearing Surface (ABS). This C-F rich polymer is a by product from using a Surface Technology Systems Multiplex-Pro Air Bearing Etch (ABE) tool that utilizes fluorine base plasma. The morphology of the re-deposition and elemental composition are investigated via scanning electron microscope. The chemical bonding information is characterized via attenuated total reflected infrared spectroscopy. The purpose of this work is to demonstrate the modification of AlF3 re-deposition to polymer rich re-deposition allows complete re-deposition removal with isopropyl alcohol base solution. This offers advantage as the re-deposition removal is incorporated during the resist strip process offering superior cleanliness of slider head without additional process steps.

Al2O3-TiC Polymer re-deposition Fluorine base plasma RIE etching

Chupong Pakpum Krisda Siangchaew Pichet Limsuwan

Department of Physics,Faculty of Science,King Mongkuts University of Technology Thonburi,Bangkok,10 Western Digital (Thailand) Company Limited,Ayuthaya,13160,Thailand Department of Physics,Faculty of Science,King Mongkuts University of Technology Thonburi,Bangkok,10

国际会议

2011 International Conference on Advanced Material Research(ICAMR 2011)(2011年先进材料研究国际会议)

重庆

英文

93-97

2011-01-21(万方平台首次上网日期,不代表论文的发表时间)