Preparation and modification MnZn ferrite thin films under swift heavy ion (SHI) irradiation

MnZn ferrite thin films are deposited by alternative sputtering technique from two targets with the composition of MnFe2O4 and ZnFe2O4, and the behavior of the magnetic properties of the MnZn ferrite thin films irradiated by Kr26+ ions at energy of 2.03 GeV is investigated by magnetization measurements. The fabricating and modifying conditions on the performance of the films are studied to improve Ms and reduce Hc of the films, making the films suitable to the applications of high-frequency film devices. For Mn1-xZnxFe2O4 thin films, the Ms increases firstly then decreases and Hc decreases monotonously with increasing Zn content. And both Ms and Hcare sensitive to Kr26+ ion irradiation and exhibit different behaviors depending on the ion fiuence range. The modifications of the magnetic properties could be interpreted very well by the effects related to the stress and defects induced by SHI irradiation.
Swift heavy ion (SHI) Irradiation MnZn ferrite thin films Modification
Jianrong Sun Zhiguang Wang Yuyu Wang Cunfeng Yao Kongfang Wei Tielong Shen Fashen Li
Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, LanzhouUniversity,
国际会议
2011 International Conference on Advanced Material Research(ICAMR 2011)(2011年先进材料研究国际会议)
重庆
英文
325-329
2011-01-21(万方平台首次上网日期,不代表论文的发表时间)