Reaction Mechanism of Al/Ti Multilayer Films
Nano-scale Al/Ti reactive multilayer films are a novel kind of energetic material which can be utilized in applications such as joining and igniting. The present study attempts to investigate the reaction mechanism of Al/Ti multilayer films. The Al/Ti multilayer films were prepared using magnetron sputtering deposition, and the individual Al layer thickness of the films was fixed at 220nm, while individual Ti layer thickness varied from 60nm to 240nm. Additionally, their total thicknesses were around 7-17μm. DTA and XRD were used to characterize the multilayer films. Two stages of reaction were observed. Results show that the first reaction stage at around 440℃-550℃ relates to formation of TiAl3, and the second stage at around 650℃-700℃ corresponds to the formation of AlTi. Furthermore, in the first reaction stage, titanium diffuses into aluminum to form TiAl3 until aluminum is completely consumed.
WANG Liang HE Bi JIANG Xiaohua FU Qiubo WANG Liling
Institute of Chemical Materials,CAEP,Mianyang 621900,Sichuan,China
国际会议
2011 International Autumn Seminar on Propellants,Explosives and Pyrotechnics(2011国际推进剂、炸药、烟火技术秋季研讨会)
南京
英文
969-972
2011-09-20（万方平台首次上网日期，不代表论文的发表时间）