213nm pitch standards fabricated using atomic lithography
Atomic lithography is a technique in which nearly resonant light is used to pattern an atom beam periodically. In this letter, a 425nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the period of the nanoscale pitch standards of 213±0.1nm. The height was 4nm. The (FWHM)width is 64±6nm. And this result will be analysed theoretically. The tracing of atoms is numerical simulated based on particle-optics and the factors of affecting deposition result will be found in this article.
Yan Ma Tongbao Li Xiangdong Lu Weigang Gong
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology Department of Physics, Tongji University, Shanghai,20092,China
国际会议
长春
英文
1-4
2011-08-29（万方平台首次上网日期，不代表论文的发表时间）