Nanoscale Structures For Implementation Of Anti-reflection And Self-cleaning Functions
(0) Well-designed optical sub-wavelength surface relief structures could be used for minimizing the reflection losses at the surface, and be used to increase the hydrophobic property of the surface, so that to improve the efficiencies and reduce the maintaining costs of solar cells. Interference lithography technology allows us to fabricate a fine surface structure with the periods that are much shorter than the wavelengths of near infrared or visible light. The morphology of the microstructure by multi-beam interference lithography can be controlled, allowing the design of sub-wavelength structure surfaces with both of antireflection (AR) function and self-cleaning function. In this paper, the analysis of the anti-reflection sub-wavelength relief structure and the self-cleaning relief structure is given, and the realization method for a multi-functional structure by using the interference lithography technology is presented.
Jin Zhang Zuobin Wang Lingxia Hang Shilei Jiang Guoqiang Liu Chunlei Tan Ze Ji
Shaanxi Province Key Lab of Thin Films Technology and Optical Test, Xi’an Technological University, CNM & IJRCNB Centers, Changchun University of Science and Technology, Changchun, China State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electroni Optoelectronics Research Centre, Tampere University of Technology, Tampere, Finland School of Computer Science, University of Hertfordshire, Hatfield, AL10 9AB, United Kingdom
国际会议
长春
英文
1-4
2011-08-29（万方平台首次上网日期，不代表论文的发表时间）