Nano Fabrication by Laser Interference
(0) Both high costs and low efficiency throughput discourage industrial end-users from expanding their nanotechnology-related activities with the conventional techniques such as ion beam lithography, electron beam lithography and scanning probe lithography. Laser interference lithography (LIL) will play a key role in realizing the full potential of interference nano-lithography. In fabrication of nano structures, LIL technology shows great advantage of high resolution, and low cost and high efficiency compared with other beam technologies. Slight differences of incidence angles may introduce an extraordinary, controllable modulation on a uniform interference pattern. High intensity enhancement and sub-wavelength focusing were achieved simultaneously. Periodic arrays of holes in GaAs, covered with SiO2 bubbles, were directly written into the sample within only some minutes for the whole nano-processing. The diameters of the smallest holes were less than 30 nm. The smallest modification features of the GaAs were less than 5 nm.
C.S.Peng C.Tan C.Tan Y.Zhou W, Zhang X.-Y.Gu W.-P.Liu
Institute of Information Optical Engineering, Soochow University, No.1 Shizi Street, Suzhou 215006, Optoelestronics Research Centre, Tampere University of Technology, Korkeakoulunkatu 3, 33720 Tampere Institute of Information Optical Engineering, Soochow University, No.1 Shizi Street, Suzhou 215006,
国际会议
长春
英文
1-4
2011-08-29（万方平台首次上网日期，不代表论文的发表时间）