The Study of Uniformity in Nano-Imprint Lithography
(0) The non-uniform behaviour of the photoresist filling into the template in the UV nano-imprint processing is studied by the finite element method in this paper. The elements which affect the uniformity are analysed systematically, such as the period of the template, the fill factor, the aspect ratio. The result shows: The size of the template whose period is less than 400nm, the fill factor is 0.5, and the aspect ratio is 1 will affect the uniformity. When the fill factor is less than 0.3 or the aspect ratio is more than 1.67, it will generate the non-uniformity too. The template possessing smaller period will achieve significant impact on the uniformity. The nano-imprint experiment has implemented, and the experiment meets well with the simulation result. It can be used as the template design and nano-imprint process reference.
Liu Ruihong Li Haihua Wang Qingkang
National Key Lab.of Micro／Nano Fabrication Technology, Key Lab.for Thin Film and Micro Fabrication Technology of Ministry of Education, Research Institute of Micro／Nano Science and Technology, Shanghai Jiao tong University, Shanghai 200240, China
国际会议
长春
英文
1-4
2011-08-29（万方平台首次上网日期，不代表论文的发表时间）