Micromachining of Single Crystalline Silicon Nanowires on (111) Silicon Wafers

摘要：

This paper reports a unique top-down fabrication method of single crystalline silicon nanowires (SiNWs) on (111) silicon wafers. Only conventional microfabrication processes of oxidations, standard photolithography, ion-beam etching, and wet anisotropic etching are required. The processed SiNWs are <110>-oriented with lateral dimensions of ~25nm and lengths of 4 microns. The design, processing and formation mechanism are presented and discussed.

作者: Qinhua Jin Tie Li Yuelin Wang

作者单位: State Key laboratories of Transducer Technology, National Key Laboratory of Microsystem Technology, SIMIT, Chinese Academy of Sciences, Shanghai , China

会议类型: 国际会议

会议名称: The First International Conference on Manipulation,Manufacturing and Measurement on the Nanoscale(第一届3M-NANO国际会议)

会议地点: 长春

会议语种:英文

页码: 1-4

在线出版日期: 2011-08-29（万方平台首次上网日期，不代表论文的发表时间）