Two-photon Induced Photopolymerization Microfabrication Study Using Photoinitiator with Intramolecular Radical Quenching Group
Two-photon induced photopolymerization (TPIP) technique has been extensively studied and established as a powerful and unique tool for micro/nanostructure fabrication in the past decade 1-3, which provides the opportunity for making structures of almost any complexity due to its capability for intrinsic three-dimensional (3D) processing. As a potential technique of advanced photolithography, improving the resolution of TPIP has been desired. Since Kawata et al demonstrated the TPIP fabrication result beyond the diffraction limit 3, a resolution of 120 nm with the laser wavelength of 780 nm, many efforts have been continually made from both viewpoints of fabrication technique and photoresists design. More recently, TPIP fabrication regions were well confined by adding radical quencher in resin SCR500 4, 5. However, in that reported approach a large amount of radical quencher, compared to the usage of photoinitiator, were needed to obtain significant confining effect. An intramolecular collision reaction is generally more rapid and efficient than an intermolecular one 6, so an intramolecular radical termination reaction may be more efficient and result in well-confined polymerization range.
Wei-Er Lu Wei-Qiang Chen Xian-Zi Dong Zhen-Sheng Zhao Xuan-Ming Duan
Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology,
国际会议
长春
英文
1-2
2011-08-29（万方平台首次上网日期，不代表论文的发表时间）