Design and Fabrication of a TSV Interposer for SRAM Integration
TSV interposer provides a cost efficient solution way for 3D IC integration. In this paper, a TSV interposer technology is proposed for SRAM stacking. A simple fabrication process is developed for cost-sensitive application. The mushroom-like Cu/Sn bumps by copper overburden can be directly connected with other substrate, which eliminates a CMP planarization to improve the yield and reduce fabrication cost. The electrical and thermal-mechanical behaviors of the 3D system were analyzed. Preliminary fabrication results are demonstrated. The TSV interposer technology is promising for 3D SRAM integration.
Yunhui ZHU Min MIAO Yufeng JIN Shenglin MA Qinghu CUI Wenping KANG Zhiyuan ZHU Xin SUN Guanjiang WANG Mengmeng ZHANG Jing CHEN
National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Peking University, Beij National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Peking University, Beij National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Peking University, Beij
国际会议
上海
英文
36-39
2011-08-08(万方平台首次上网日期,不代表论文的发表时间)