Variable EWMA Controller for High Mixed Semiconductor Manufacturing Processes
In high mixed semiconductor processes,the group and product Exponentially Weighted Moving Average (G&P EWMA)controller is a popular model based on run-to-run controller.Otherwise,how to select optimum weights is the key issue in the G&P EWMA control.In this paper,an auto-tuning scheme for G&P EWMA controller is proposed to improve the control performance.Optimum weights of G&P EWMA controller for next run are found using iterative algorithm which based on a set of previous run data.Then,the dataset is updated by a moving window approach.The auto-tuning of G&P EWMA controller can ensure that every run is under the best operation.The validation of the proposed method is demonstrated by an industrial application.
CHEN Shan PAN Tian-Hong CHANG Chun-Cheng WONG David Shan-Hill JANG Shi-Shang
School of Electrical and Information Engineering,Jiangsu University,Zhenjiang,Jiangsu 212013,P.R.Chi Department of Chemical Engineering,National Tsing-Hua University,Hsin-Chu 30013
国际会议
The 30th Chinese Control Conference(第三十届中国控制会议)
烟台
英文
1-4
2011-07-01（万方平台首次上网日期，不代表论文的发表时间）