Application of Argon Ion Beam Cross Section Polishing in Material Microstructure Research
Scanning Electron Microscope (SEM) has been widely used in the observation of surface and cross section of materials. So it is important to prepare the cross section of various specimens. In this study, a novel cross section preparation method using argon ion beam (called argon ion beam cross-section polisher or CP) was introduced. This method can not only overcome the problem of artifacts caused by mechanical polishing on the polished surface, but also enable one to prepare a wider area of specimens than the Focused Ion Beam (FIB) method. The soft materials, composite materials with different hardness, multilayer films and powders were all easily polished with few artifacts using this method.
Wang Yong-Zhe Wu Wei Liu Zi-Wei Zeng Yi Ding Min-Ju Zhang Cheng-Gong
The State Key Lab of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of C State Key Laboratory Breeding Base of Crime Scene Evidence, Shanghai, China, 200083
国际会议
长沙
英文
419-423
2011-06-30（万方平台首次上网日期，不代表论文的发表时间）