The AFM Measuring Technology and Image Analysis in the Fabrication Process of Diffraction Grating

摘要：

Aiming at the topographic characteristics of the diffraction grating and the working principle of AFM, the measuring technology including the measures to eliminate the artifacts and image analysis in the grating fabrication process are given. Extended abstract AFM (Atomic Force Microscopy) is an important measuring instrument which has nanometer resolution. The diffraction grating is the key optic component in the spectral instrument. The AFM measuring technology can be introduced to acquire the topography of the diffraction grating in the fabrication process of grating.

作者: Ying Song Chengshan Zhang Hongzhu Yu Peihua Duan

作者单位: Chang Chun Institute of Optics, Fine Mechanics and Physics, CAS

会议类型: 国际会议

会议名称: International Conference on Micro/Nano Optical Engineering (纳米光学工程国际会议 ICOME 2011)

会议地点: 长春

会议语种:英文

页码: 174-175

在线出版日期: 2011-06-12（万方平台首次上网日期，不代表论文的发表时间）