1.55 μm Photoluminescent Iron Silicide Prepared by Thermal Diffusion of Iron Nanoparticles into Si Substrate
The iron silicide thin-films prepared by thermal diffusion of Iron nanoparticles into Si Substrate at 900℃ in pure N2 environment is demonstrated to show strong roomtemperature photoluminescence (PL) at 1.55 μm. The increase of iron nanoparticle concentration from 7.4 wt% to 19 wt% further effectively enhances the room-temperature PL intensity.
Yi-Hao Pai Kuang-Nan Cheng Gong-Ru Lin
Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, National Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, National
国际会议
Asia Communications and Photonics Conference and Exhibition(2010亚洲光纤通信与光弹博览会及研讨会 ACP 2010)
上海
英文
166-167
2010-12-08(万方平台首次上网日期,不代表论文的发表时间)