Comparison of TiO2-doped SiO2 films from two organosilicon precursors
In present work the effect of two different source of silicon Tetraethylorthosilicate and Octamethylcyclotetrasiloxane on TiO2-doped SiO2 films have been studied. The study reveals that film properties depend on the precursors used for deposition. The optical, chemical and surface properties have been characterized using ellipsometer and SEM with EDAX.
Jaspal P.Bange Lalit S.Patil D.K.Gautam
Department of Electronics Engineering, Gunma University, 1-5-1 Tenjin-cho, Kiryu-shi 376-8515, Japan Department of Electronics, North Maharashtra University, Jalgaon -425 001 (M.S.), India
国际会议
Asia Communications and Photonics Conference and Exhibition(2010亚洲光纤通信与光弹博览会及研讨会 ACP 2010)
上海
英文
242-243
2010-12-08(万方平台首次上网日期,不代表论文的发表时间)