Silicon-on-Insulator Bragg Gratings Fabricated by Deep UV Lithography

摘要：

We demonstrate the design and performance of Bragg gratings on silicon-on-insulator waveguides. Two structures for achieving the modulation of the effective index of refraction are described. The grating fabrication is based on deep ultra-violet lithography using a single mask. The thermal tunability of the devices is demonstrated.

作者: Xu Wang Wei Shi Raha Vafaei Nicolas A.F.Jaeger Lukas Chrostowski

作者单位: Department of Electrical and Computer Engineering, University of British Columbia, V6T 1Z4, Canada

会议类型: 国际会议

会议名称: Asia Communications and Photonics Conference and Exhibition(2010亚洲光纤通信与光弹博览会及研讨会 ACP 2010)

会议地点: 上海

会议语种:英文

页码: 501-502

在线出版日期: 2010-12-08（万方平台首次上网日期，不代表论文的发表时间）