Deep Groove Etching for Partial Reflectors in InP-based Monolithically Integrated Photonic Devices

摘要：

Dry etching process of InP is developed using inductively coupled plasma (ICP) with halogen and hydrocarbon based gas mixture. This recipe is optimized for deep groove etching requiring a high anisotropy and smooth surface morphology in integrated photonic device fabrication. A laser with good performance is fabricated using the etched groove as a partial reflector.

作者: Yin Wang Lei Wang Jialiang Jin Jian‐Jun He

作者单位: Center for Integrated Optoelectronics, State Key Laboratory of Modern Optical Instrumentation, Zheji Center for Integrated Optoelectronics, State Key Laboratory of Modern Optical Instrumentation,Zhejia

会议类型: 国际会议

会议名称: Asia Communications and Photonics Conference and Exhibition(2010亚洲光纤通信与光弹博览会及研讨会 ACP 2010)

会议地点: 上海

会议语种:英文

页码: 730-731

在线出版日期: 2010-12-08（万方平台首次上网日期，不代表论文的发表时间）