Fabrication of La0.85Na0.15Mn1-xNixO3 (0≤x≤0.2) thin films on LaAlO3 substrates via chemical solution deposition
Epitaxial La0.85Na0.15Mn1-xNixO3 (0≤x≤0.2) thin films are fabricated successfully on LaAlO3 (LAO) (100) substrates using chemical solution deposition method. The results reveal that with the increase of the Ni-doping content, the x-ray diffraction intensity ratio of I(111)/I(200) increases, whereas both the grain size and the roughness decrease. The magnetic and transport measurements show that it is effective to tune the MR effects via Ni doping at Mn-sites.
Liu Shengman Bian Yadong Wang Tingtai Yang Linfeng Sun Xiaowei Zhang Jingchang
Zhongyuan University of Technology, Zhengzhou 450007, P.R.China
国际会议
桂林
英文
1-6
2010-11-16(万方平台首次上网日期,不代表论文的发表时间)