Study of controlled growth of carbon nanotubes in microstructures at low temperature

摘要：

Catalytic chemical vapor deposition (CVD) is a promising technique for growing carbon nanotube (CNT) cathode for the field emission display (FED). However, it is still difficult to grow CNTs of high quality under low temperature (below 600..), especially in the micro-structures of FED panels. With thermal-CVD, we make efforts to improve the quality of CNTs by varying the thickness of catalyst (Ni), processing time of hydrogen treatment, flow rate of reaction gas (C2H2) and study the properties of CNTs on different buffer layers (W, Ti, etc) in micro-structures on glass substrates, systematically.

作者: D Yang Jun Chen S Z Deng N S Xu

作者单位: State Key Lab of Optoelectronic Materials and Technologies, Guangdong Province Key Lab of Display Ma State Key Lab of Optoelectronic Materials and Technologies, Guangdong Province Key Lab of Display Ma

会议类型: 国际会议

会议名称: 2010 8th International Vacuum Electron Sources Conference and NANOcarbon(第八届真空电子源和纳米碳国际会议)

会议地点: 南京

会议语种:英文

页码: 518

在线出版日期: 2010-10-14（万方平台首次上网日期，不代表论文的发表时间）