Preparation and Characterization of Nickel Oxide Thin Films by a Simple Two-step Method
As an electrochromic material, nickel oxide thin films have a wide range of applications, such as energy-efficient windows, multi-color display, high contrast and non-radiation information display owing to its high discolor efficiency, good broadband absorption and neutral color properties 1. There are many preparation methods to meet the need for more applications, such as magnetron sputtering, pulsed laser deposition, sol-gel, thermal decomposition, and electrochemical deposition 2-5. In this work, we use a simple two-step method to prepare nickel oxide thin film, which includes the metal nickel films deposited on silicon substrate and followed by thermal annealing. Briefly, metal nickel thin films were deposited by magnetron sputtering below the pressure of 4.5..10-3 Pa, the voltage of cathode slowly increased from 300V to 600V for about 10 minutes, using argon iron to bombard the nickel target and the sputtering current is 1A. After that, metal after nickel thin films were thermal annealed in the air at 2000C, 4000C and 6000C for an hour, respectively.
C.Y.Li Z.W.Zhao
School of Electronic Science and Engineering, Southeast University,Nanjing, China, 210096 School of Electronic Science and Engineering, Southeast University, Nanjing, China, 210096
国际会议
2010 8th International Vacuum Electron Sources Conference and NANOcarbon(第八届真空电子源和纳米碳国际会议)
南京
英文
648-649
2010-10-14（万方平台首次上网日期，不代表论文的发表时间）