Hierarchical Assembly of Nanoscale Polymer Domains in Microstructure Template Made by AFM Machining technique
A combined top-down/bottom-up hierarchical approach were presented to fabricate massively arrays of aligned nanoscale domains by means of the self-assembly of asymmetric poly (styrene-blockethylene/butylenes-block-styrene) (SEBS) tirblock copolymers. Silicon substrates of various microstucture made by AFM machining technique are used to template the alignment of spherical and high-aspect-ratio cylindrical polymer domains. The periodic arrays of the poly domains were orientated via the introduction of AFM micromachining technique as a tool for locally controlling the self-assembly process of triblock copolymers by the topography of the silicon substrate. This graphoepitaxial methodology can be exploited in hybrid hard/soft condensed matter systems for a variety of applications. Moreover, Pairing top-down and bottom-up techniques is a promising, and perhaps necessary, bridge between the parallel self-assembly of molecules and the structural control of current technology.
Yongzhi Cao Jinghe Wang Fuli Yu Yongda Yan Shen Dong
Center for Precision Engineering，Harbin Institute of Technology，Harbin，150001，China School of Mechatronics Engineering，Harbin Institute of Technology，Harbin，150001，China
国际会议
天津
英文
1-5
2010-09-24（万方平台首次上网日期，不代表论文的发表时间）