Analysis of Imperfect Cr Source in 1D Atom Lithography for Nano-metrology
Periodic nanostructures applied for nanometrology can be obtained by laser-focused atomic deposition. The property of Cr source dominantly influences the quality of the nanostructures. The effect of imperfect Cr source is analyzed via well-developed particle optics method. Velocity-dependant force is incorporated in atom lens model. Numerical calculations have revealed that the transverse velocity distribution plays a central role in broadening the feature width of the resulting nanostructures. The position of focal plane of the atom lens is determined by the longitudinal velocity distribution. Moreover, some other factors such as sublevel magnetic population and isotopic of Cr are also discussed. The calculations are in qualitative agreement with our experimental results. Then some strategies are presented to improve our experiment.
Zhang Pingping Ma Yan Wu Wen Xiao Yili Gong Weigang Li Tongbao
Department of physics, Tongji University, Shanghai 200092, China
国际会议
天津
英文
1-4
2010-09-24（万方平台首次上网日期，不代表论文的发表时间）