CONTROLLABLE FABRICATION OF STANDARD INVOLUTE MICROGEARS

摘要：

In this paper, standard involute microgears were fabricated by femtosecond two-photon polymerization (FTPP) in SU-8 photoresist. In order to obtain standard involute microgears with high-precision, the scan strategy for the fabrication of microgears was improved. The effects of photoresist curing, laser power and the scan step in the X/Y and Z directions on the quality of microgears were systematically studied. Relevant parameters of microfabrication were optimized. Based on these investigations, standard involute microgears with high dimension precision and finer surface morphology have been fabricated with laser power of 12 mW, steps of 0.1μm in the X/Y directions and 0.3 μm in the Z direction. The pitch diameters are from 10 μm to 30 μm. Comparison of the scanning electron microscope (SEM) images of microgears with the standard template has been made, and the dimension error is quantitatively estimated within 1 μm.

作者: Liang Yang Jiawen Li Junjun Ding Shufeng Sun Wenhao Huang

作者单位: Department of Precision Machinery and Precision Instrumentation, University of Science and Technolog School of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou 325035, P.R.China

会议类型: 国际会议

会议名称: 2nd International Conference on Nanomanufacturing，1st CIRP Conference on Nanomanufacturing(第二届纳米制造国际会议)

会议地点: 天津

会议语种:英文

页码: 1-4

在线出版日期: 2010-09-24（万方平台首次上网日期，不代表论文的发表时间）