Hydroxyapatite deposited on flat and porous Ti
Formation of porous Ti layer during electrochemicaletching in H3PO4+NH4F, subsequent deposition of calcium-phosphateand corrosion behavior of the materials was described.Anodic etching results in surface roughening with pits diameterin the range of 7-12 μm. The subsequent cathodic electrochemicaltreatment, results in hydroxyapatite (HA) deposition. The sourceof Ca and P were two types of electrolytes: 0.1M HCl+0.005MHA and 0.042M Ca(NO3)2+0.025M (NH4)2HPO4+0.1M HCl.The formed HA layer has lamellas structure. The depositedcalcium-phosphate layer could be useful for the osseointegrationand presents excellent corrosion resistance in simulated bodyfluids. The corrosion current Ic for flat Ti, porous Ti and porousTi with HA layer is: 3.9cm -2 , 2.52cm -2 and 1.07cm -2 respectively. It was found, that anodization andsubsequent calcium-phosphate deposition, results in bettercorrosion resistance of the samples, with comparison to thesample without these treatments.
J.Jakubowicz G.Adamek
Institute of Materials Science and Engineering Poznan University of Technology Poznan, Poland
国际会议
成都
英文
1-4
2010-06-18(万方平台首次上网日期,不代表论文的发表时间)