The Etching Process Modeling and Visualization for Lithography Simulation
In this paper, it presents a transformation and expansion formulation for the original two-dimensional model of a simple etching. And this paper proposes a new mathematical model that is suitable for three-dimensional integrated circuit etching process. Further, In order to simulate a calculating process of etching with digital computers, then it gives the correspondingly discretized equations for the mathematical formulation of the three-dimensional integrated circuit etching model. Meanwhile, the articles have a research of the evolution of the etching surface and give the relevant mathematical models; also conduct a study of the key algorithm and its implementation about the etching model visualization simulation technology; Finally, it gives the simulation results and visualization discussion.
Xiang Zou Xiangyang Wang Wanggen Wan Xiao Cheng Chenglin Shi
国际会议
上海
英文
341-345
2010-10-20（万方平台首次上网日期，不代表论文的发表时间）