会议专题

Models Improvement and Display Optimization for Three-Dimensional Etching Simulation in Lithography Process

An overall lithography simulation has become an essential factor for semiconductor manufacturing, etching is a fatal process in the integrate circuit manufacture. Integrate circuit simulation is an important assistant method. This paper brings forward a math model of integrated circuits etching process and digitalizes the model, which is suited to 3D lithography environment and can be simulated through digital computers. At the same time, the surface evolving process of the etching process is considered and the related math model is proposed. Also the visualization technology and the related implementation of the etching process simulation are analyzed. At last, the result of the simulation is presented and discussed.

Xiang Zou Xiangyang Wang Wanggen Wan Xiao Cheng Chenglin Shi

国际会议

第十届中国虚拟现实年会

上海

英文

468-472

2010-10-20(万方平台首次上网日期,不代表论文的发表时间)