Deposition and sputtering yields on EUV collector mirror from Laser Plasma Extreme Ultraviolet Sources
Based on the self-similar solution of gas dynamic equations, spherical expansion of the highly ionized plasma with limited mass into a vacuum is investigated for the droplet target laser-produced plasma extreme ultraviolet (LPP-EUV) sources. Using partially numerical and partially analytical technology, the velocity, the temperature and the density profiles in the plume versus ionization degree, adiabatic index and initial conditions are presented. Furthermore, the spatial thickness variations of the deposited substrate witness and ion sputtering yields for Ru, Mo, and Si under Sn ion bombardment are theoretically calculated, which can be useful to enable LPP-EUV sources suppliers to estimate collector lifetime and improve debris mitigation systems.
Tao Wu Zhiming Rao Shifang Wang
Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Hua Depart of Computer Science, Jiangxi University of Traditional Chinese Medicine,Nanchang 330004, Jian School of Physics and Electric Information, Hubei University of Education 1 Nanhuan Road, Wuhan East
国际会议
3rd International Photonics & OptoElectronics Meetings(第三届国际光子与光电子学会议 POEM 2010)
武汉
英文
1-8
2010-11-03（万方平台首次上网日期，不代表论文的发表时间）