Study on XRD、Optical and Electrical performance of Transparent Conducting ZnO:Al(ZAO) Thin Films

摘要：

The ZAO (ZnO: Al) thin films were prepared by DC reactive magnetron sputtering technique. The XRD, electrical and optical properties of films are particular investigated-The results show that ZAO films are polycrystalline hexagonal wurtzite structure, and we are not rind A12O3 crystal phase. At the same time, we gained the high quality ZAO films with the minimum resistivuty of 4.5×10-4 Ω ? cm, the transmittance in visible region above 80％ and the reflectivity in IR region above 70％.

作者: LU Feng XU Cheng-hai WEN Li-shi

作者单位: School of Transportation and Mechanical Engineering, Shenyang Jianzhu Uinversity,Shenyang,l 10168,Ch School of Mechanical Engineering & Automation, Northeastern University.Shenyang 110004, China Institute of Metal Research, The Chinese Academy of Sciences, Shenyang 110015, China.

会议类型: 国际会议

会议名称: 3rd International Photonics & OptoElectronics Meetings(第三届国际光子与光电子学会议 POEM 2010)

会议地点: 武汉

会议语种:英文

页码: 1-7

在线出版日期: 2010-11-03（万方平台首次上网日期，不代表论文的发表时间）