Optical properties of LuFeO3 thin films prepared by pulsed laser deposition
The LuFeO3 thin films were successfully prepared by pulsed laser deposition on silicon and LaNiO3-coated silicon substrates, respectively. The crystalline structure of the films has been studied by x-ray diffraction and indicated that all the films were well-crystallized. Atomic force microscope was used to characterize the surface morphology of the films and the surface was uniform and dense. Raman spectra measurements were carried out to study the lattice vibration modes of the films in the 200-1000 cm-1 wave number range. Polarization-electric field hysteresis loops of the LuFeO3 thin films were measured at applied electric field.
L P Zhu H M Deng X X Li P X Yang J H Chu
Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronics, Eas Key Laboratory for Material Microstructures of Shanghai University, Shanghai University, 99 Shangda
国际会议
3rd International Photonics & OptoElectronics Meetings(第三届国际光子与光电子学会议 POEM 2010)
武汉
英文
1-5
2010-11-03(万方平台首次上网日期,不代表论文的发表时间)