Simulation of the Magnetic Field on Rectangular Magnetron Sputtering Target
In order to research the homogeneous distribution of magnetic field on rectangular magnetron sputtering target,in this paper,rectangular magnetron sputtering target is the object of study,which is researched and developed by SKY Technology Development Co.,Ltd,and used in K07-087-type coating production line. The magnetic field distribution on straight area near the center cross-section of rectangular magnetron sputtering target is simulated by ANSYS finite element software. Then the distribution of horizontal magnetic field on the target surface is measured by gauss meter. The accuracy of the finite element model is verified by comparing experimental and simulated results. Based on the verified finite element model,all structural parameters that are able to affect strength and homogeneity of horizontal magnetic field are systematically analyzed,through the finite element simulation of magnetic field. The structural parameters include distance between the target and the pole shoe,height of the magnetic steel,width and height of fee inner magnetic steel,width and height of the outer magnetic steel,length and thickness of magnetic sheet. This paper has important guiding significance for design and improvement of rectangular magnetron sputtering target.
rectangular magnetron sputtering target simulation of magnetic field finite element analysis uniformity of the magnetic field
ZHANG Yi-Chen GUO Yong-Bang SONG Qing-Zhu ZHANG Jun-Hao
Vacuum and Fluid Engineering Research Centre,Northeastern University,Shenyang 110004,China ShenYang Vacuum Technology Institute, Shenyang 110042,China
国际会议
沈阳
英文
155-161
2011-05-22（万方平台首次上网日期，不代表论文的发表时间）