Effect of Annealing on Mechanical Properties of TaN Film
Tantalum nitride (TaN) films were synthesized on bearing steels and Silicon wafers by Electron Cyclotron Resonance microwave plasma source enhanced DC sputtering and the effects of annealing at different low temperature on mechanical properties of TaN films were investigated. The morphology and structure of the films were investigated by scanning electron microscope (SEM), X-ray diffraction (XRD) and X-ray Photoelectron Spectroscopy (XPS). The mechanical properties were evaluated using nano-indentation. The results showed that the hardness and modulus of TaN film without annealing presented the maximal value, but which intensely dropped down with the increase of annealing temperature between 423K and 473K, meanwhile structure and combination in the films partially changed and this phenomenon disappeared beyond the range. It is found that annealing is a key factor for altering structure and mechanical properties of TaN film.
magnetron sputtering tan film annealing
X.Liu G.J.Ma Lin Zhang G.Sun Y.P.Duan S.H Liu
School of Material and Engineering, Dalian University of Technology, Dalian, China,Science and Techn School of Material and Engineering, Dalian University of Technology, Dalian, China Science and Technology on Power Beam Processes Laboratory, Beijing Aeronautical Manufacturing Techno
国际会议
北京
英文
267-269
2010-10-25（万方平台首次上网日期，不代表论文的发表时间）