Simulation on Nanoimprint of Grating Structures
Nanoimprint lithography (NIL) is an important nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist. Fabricating gratings by NIL can manufacture lots of replica in a fast way. Simulation on the NIL process has a vital role on choosing optimized parameters. One finite element analysis software DEFORM was used to analyze different imprint factors. Through simulation optimization, it was found that imprint temperature, pressure and time strongly affected the replication fidelity. The simulation result will guide the NIL experiment.
simulation optimization nanoimprint grating micro/nanostructures replication
Hongwen Sun Guogao Liu Shanming Lin
College of Computer and Information Engineering Hohai University Changzhou, China Jiangsu Key Laboratory of Power Transmission and Distribution Equipment Technology
国际会议
太原
英文
293-295
2010-10-22（万方平台首次上网日期，不代表论文的发表时间）