Fast Marching Simulation of Two-Dimensional Lithography Process of Thick Photoresists

摘要：

Fast marching method is an accurate, extremely fast numerical technique in analyzing and computing moving fronts which can develop sharp corners and change topology. We successfully accomplish this method in two dimensions and the two-dimensional lithography process simulation of SU-8 photoresists has been implemented. The obtained results indicate that the fast marching method can actually accelerate the simulation and be used as an effective method for thick photoresist lithography process simulations.

关键词： fast marching method level set techniques lithography process SVS photoresist

作者: Li-Li Shi Bei Chen Zai-Fa Zhou Qing-An Huang

作者单位: Key Laboratory of MEMS of Ministry of Education, Southeast University, Nanjing, China

会议类型: 国际会议

会议名称: 2010 6th International Conference on MENS NANO,and Smart System(2010年微机电纳米、智能系统国际会议 ICMENS 2010)

会议地点: 长沙

会议语种:英文

页码: 137-140

在线出版日期: 2010-12-14（万方平台首次上网日期，不代表论文的发表时间）