Dimension Reduction of Photolithography Data Based on PCA
Embed system plays an important role in our daily life, among which SoC is a key part. With the development of SoC, the complexity of Photolithography increases sharply. Dimension reduction to assist design is very essential for the photolithography simulation in order to display large scale simulation data. In this paper, an approach to reduce data dimension of the simulation results is proposed. This system is not a photolithography simulator but a dimension reduction display system, in which simulator data source is needed. The principle applied in this system is PCA which is widely used in dimension reduction. In the system the displayed data can be controlled flexibly. The experiment results demonstrate its high efficiency.
Lei Wang Xiangyang Wang Wanggen Wan Xiaodong Yang Bin Cui
School of Communication and Information Engineering, Shanghai University
国际会议
上海
英文
1090-1093
2010-11-23（万方平台首次上网日期，不代表论文的发表时间）