HV-LCD Drivers IC on Novel 150V-BCD Process Platform
A novel 150V-BCD technology by using Hum thick epitaxy based on 0.35um standard CMOS process has been developed for LCD backlighting application. In the whole process with 24 steps, HV circuit block, including VDNMOS and LDPMOS with double resurf principle, and LV block are integrated together. Advanced deep trench isolation (DTI) technology with the breakdown voltage above 150V is firstly in place of conventional piso isolation (PISO) structure to protect HV block from LV block. Finally, it is shown that designed IC driver can satisfy the EL lamp application with frequency at least 400Hz of the switch signal and the power supply about 100 V. For the simplicity of the technology, the cost is also apparently saved.
Wei Huang Sheng Wang Nanzhong Hu Shudan Zhang Juyan Xu
58th Research Institute, China Electronics Technology Group Corporation (CETC), Wuxi 214061, China
国际会议
上海
英文
120-122
2010-11-01（万方平台首次上网日期，不代表论文的发表时间）