Multilevel Storage Characteristics in ZrO2-ReRAM Brought about by Ideal Current Limiter
1T1R-architecture devices were fabricated by integrating ZrO2 based crossbar structure ReRAM onto a foundry-built MOSFET platform. Multilevel operation was realized by using the current limit of a selected cell transistor in the set process. The current level was determined by the transistors gate voltage, resulting in the control of electrical resistance of the filamentary conductive paths in the low resistive state.
Resistive switching Compliance current Parasitic capacitance Multilevel
Wen-Tai Lian Ming Liu Shi-Bing Long Hang-Bing Lv Qi Liu Ying-Tao Li Yan Wang Sen Zhang Yue-Hua Dai Jun-ning Chen
Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronic Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronic College of Electronics and Technology, Anhui University, Hefei, 230039, China
国际会议
上海
英文
1112-1114
2010-11-01(万方平台首次上网日期,不代表论文的发表时间)