Structural evolution of the incubation layer in microcrystalline silicon films deposited by Jet-ICPCVD

摘要：

Hydrogenated microcrystalline silicon films without an amorphous incubation layer were deposited on glass substrates at a high rate and a low temperature by a jet-type inductively coupled plasma chemical vapor deposition technique. It was observed that the amorphous incubation layer present at the initial stage of the deposition gradually crystallized during the growth process, and an almost completely crystallized layer was obtained. It is believed that abundant hydrogen atoms with sufficient energy diffuse into the incubation layer and subsequently annealing through a hydrogen mediated chemical reaction to induce the structural evolution of the incubation layer.

作者: Zewen Zuo Yu Wang Yu Xin Jin Lu Junzhuan Wang Lin Pu Yi Shi Youdou Zheng

作者单位: School of Electronic Science and Engineering, and Key Laboratory of Photonic and Electronic Material School of Physical Science and Technology, Soochow University, Suzhou 215006, China

会议类型: 国际会议

会议名称: 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology(第十届固态和集成电路技术国际会议 ICSICT-2010)

会议地点: 上海

会议语种:英文

页码: 1536-1538

在线出版日期: 2010-11-01（万方平台首次上网日期，不代表论文的发表时间）