Effect of rapid thermal annealing on the optical properties of Nb2O5-Al2O3 nanolaminate films

摘要：

Nb2O5-Al2O3 nanolaminate films have been grown by atomic layer deposition using (Nb(OC2H5)5)/H2O, and Al(CH3)3/H2O precursors, respectively. Effect of rapid thermal annealing (RTA) on the optical properties of the nanolaminate has been studied using Fourier transform infrared spectroscopy (FTIR), and spectroscopic ellipsometry. From the FTIR result, Al2O3 suppresses the formation of interfacial layer during RTA. The refractive index of the ND2O5-Al2O3 films is found to increase after the RTA at 500 ℃, while decrease with the RTA temperature above 500 ℃. Moreover, the optical band gap of Nb2O5 film deduced from the extinction coefficient shows a gradual increase with increasing annealing temperature, which is related to a decrease in the film disorder.

作者: Yue Huang Yan Xu Hong-Liang Lu Qing-Qing Sun Shi-Jin Ding Wei Zhang

作者单位: State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 2004 State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University,Shanghai 20043

会议类型: 国际会议

会议名称: 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology(第十届固态和集成电路技术国际会议 ICSICT-2010)

会议地点: 上海

会议语种:英文

页码: 1551-1553

在线出版日期: 2010-11-01（万方平台首次上网日期，不代表论文的发表时间）