A New Method for Series Resistance Extraction in Poly-Si Thin-Film Transistors
A new method for extraction of series resistance is proposed for poly-Si thin-film transistors, hi this method, the extraction procedure is insensitive to the variation in effective channel length and device mobility, since both quantities are included in a single extracted parameter. The method has been successfully applied to a group of poly-Si TFTs with mask channel length from 2 to 30μm. Compared with the estimated series resistance, the extracted result is reasonable.
Yan Zhou Mingxiang Wang Man Wong
Dept. of Microelectronics, Soochow University, Suzhou 215006, China Dept. of Electronic and Computer Engineering, the Hong Kong Univ. of Science and Technology, Hong Ko
国际会议
上海
英文
1814-1816
2010-11-01(万方平台首次上网日期,不代表论文的发表时间)