Five-beam Interference Pattern Model for Laser Interference Lithography

摘要：

Laser interference lithography (LIL) is an established fabrication technology for micro and nano scale structuring of periodic and quasi-periodic surface patterns. This paper presents a Five-beam Interference Pattern Model for laser interference lithography. It can be programmed to obtain images of interference results showing interference intensity distributions. The majority of 2-5 beam interference patterns can be simulated by this model with every variable in an LIL system. In this work, different technologies for nano structuring are introduced, along with the principle of the five-beam interference pattern model. Several images of interference results obtained by the five-beam interference pattern model are shown and some of their possible applications are discussed. Three-beam interference patterns and five-beam interference patterns are formed using a laser beam that goes along the z axis which is not used commonly in other LIL models.

关键词： five-beam interference pattern model laser interference lithography nano structuring nano patterning

作者: Xiangying Deng Zhen Hu Guowei Xiu Zhengxun Song Zhankun Weng Jia Xu

作者单位: Institute of Physics,Jilin UniversityChangchun,China CNM & IJRCNB Centers Changchun University of Science and Technology Changchun,China

会议类型: 国际会议

会议名称: 2010 IEEE信息与自动化国际会议(ICIA 2010)

会议地点: 哈尔滨

会议语种:英文

页码: 1-6

在线出版日期: 2010-06-20（万方平台首次上网日期，不代表论文的发表时间）