Research of Etching A Novel MEMS Gyroscope Sensing Pendulum
A novel MEMS gyroscope sensing pendulum was etched with KOH by isothermal magnetic stirrer, and the etching rate relation with temperature and concentration was investigated in the mask of SiO2. The results reveal that a rate of etching Si(100), Si(100) to SiO2 and Si(100) to Si(111) is 4.0μm/min, 550:1 and 90:1 respectively, a uniformity etching surface and ideal etching rate are obtained for a concentration of 30%KOH at 110 , meet the production of MEMS gyroscope requirements.
MEMS Wet Etching KOH Magnetic
Yu Liu Baisheng Sun Fuxue Zhang Wei Zhang
School of Automation Beijing University of Posts and Telecommunications Beijing,China Research Center of Sensor Technology Beijing Information Science Technology University Beijing,China
国际会议
2010 IEEE信息与自动化国际会议(ICIA 2010)
哈尔滨
英文
1-4
2010-06-20(万方平台首次上网日期,不代表论文的发表时间)