Effect of sputtering input power of Co on structure and magnetic properties of Fe-Co-N thin films

摘要：

Fe-Co-N thin films with various Co content were synthesized on Si (111) substrate using facing-target magnetron sputtering by changing sputtering input power on Co target. During deposition, the input power on Fe target was kept at 160 W. The composition, structure, and magnetic properties were examined by X-ray photoelectron spectroscopy, X-ray diffraction (XRD), transmission electron microscopy (TEM), and superconducting quantum interference device. XRD and TEM investigations showed that at lower input power of 11.2 W on Co target, the phases in the film were γ-(Fe,Co)4N and Co3N. Increasing sputtering input power, the content of Co in the film increased. At input power of 14 W, film contained α-(Fe,Co)8N phase was produced which exhibited higher saturation magnetization (252.85 Am2/kg) and lower value of coercivity (3.66 kAm-1), corresponded to the ～12％ content of Co in the film.

关键词： Fe-Co-N film input power saturation magnetization coercivity

作者: Wang Xin Jia Hui Zheng Weitao Xu Wei Long Beihong

作者单位: Department of Materials Science, Key Laboratory of Automobile Materials of MOE, Jilin University, Ch School of Physics, Beihua University, Jilin, 132021, PR China State Key Laboratory of Inorganic Synthesis and Preparative Chemistry, College of Chemistry, Jilin U Department of Materials Science, Jilin University, Changchun, 130012, PR China

会议类型: 国际会议

会议名称: 第二届多功能材料与结构国际会议

会议地点: 青岛

会议语种:英文

页码: 635-638

在线出版日期: 2009-10-09（万方平台首次上网日期，不代表论文的发表时间）