Influence of substrate temperature on the characteristics of LaB6 films
Lanthanum hexaboride (LaB6) films were deposited on SiO2 substrates in a vacuum chamber by d.c. magnetron sputtering from Lanthanum hexaboride pellet target. The fabricate temperature was adjusted from per 50℃. The influence of fabricate temperature on the characteristics of the films was studied. The surface morphology was studied by atom force microscope (AFM). The results of the AFM proved that the films were compact and even. Maximum roughness of the films is no more than 15.1 nm, and the average roughness is less than 3.1nm. The results of XRD showed that the structure of the films is crystal, except the film that fabricated at the temperature of 500℃. It is noticeable that the (100) crystal face is dominated in the film, and that is different from the bulk LaB6. The crystallization of the films changed obviously. Films that fabricated at 400℃ crystallized better than others. The film thickness was measure using a Stylus Profiler. The results of the Stylus Profiler proved that the temperature showed little effect on the thickness of the films.
Lanthanum hexaboride Film DC Magnetron Sputtering Characteristics
Xu Jing Min Guanghui Zhao Xiaohua Yu Huashun
Department of Civil Engineering, Shandong Jiaotong University Jinan 250023, PR China Key Laboratory Key Laboratory of Liquid Structure and Heredity of Materials, Ministry of Education, Shandong Univer
国际会议
青岛
英文
915-918
2009-10-09（万方平台首次上网日期，不代表论文的发表时间）