Preparation and Properties of TiN Thin Films by D.C. Reactive Magnetron Sputtering
TiN thin films were deposited by D.C reactive magnetron sputtering on glass and metal substrate. The relations between the technical conditions and the properties of the thin films are studied, According to control the intensity of gas pressure by changing the flux of Ar and N2, the structure of TiN films could be control. By changing the target power 、 N2 flux and substrate temperature, the relations between the technical conditions and the structure of TiN thin films were analyzed so as to produce the TiN thin films of excellent decorations, good corrosion resistance and high micro-hardness.
TiN thin films magnetron sputtering transmittance micro-hardness roughness rate
SHAN Yu-qiao GU Xun-lei WANG You-xin
Key laboratory for Anisotropy and Texture of Materials, Ministry of Education, Northeastern University, Shenyang 110004, China
国际会议
青岛
英文
2275-2278
2009-10-09（万方平台首次上网日期，不代表论文的发表时间）