HVM LPP EUV SOURCE SYSTEM DEVELOPMENT STATUS
Laser produced plasma (LPP) EUV systems have been considered as a viable and scalable approach for the EUV scanners at sub- 32nm and beyond nodes on the ITRS roadmap. High EUV power and reduction of chamber contaminations inside EUV vacuum chambers or to EUV scanner optics are two main concerns for the LPP EUV source system development. In this paper, a review of Cymer LPP EUV development progress will be provided along with productization status for LPP EUV sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. The latest results on high EUV power generation, debris mitigation and clean transmission of EUV light through the intermediate focus will be described. Finally, a development roadmap to achieve high LPP EUV source power will be illustrated.
Benjamin Szu-Min Lin David Brandt Nigel Farrar
Cymer Southeast Asia Ltd., 3F, No. 49, Lane 2, Kuang Fu-Rd., Sec. 2, Hsin-Chu, Taiwan, R.O.C. Cymer Inc., 17075 Thornmint Ct., San Diego, CA 92127
国际会议
China Semiconductor Technology International Conference 2010(中国国际半导体技术大会 CSTIC)
上海
英文
461-466
2010-03-18（万方平台首次上网日期，不代表论文的发表时间）