Electrostatic Control and The Need of Feedback Control Ionization In Critical Environment of MEMS Manufacturing Process
This paper describes new electrostatic control countermeasures and solutions for critical electrostatic control environment that can be implemented in MEMS manufacturing, especially in MEMSs wafer handling that needs low electrostatic voltage. This includes ESD event measurement, machine grounding verification, and low ion imbalance ionization to support current and future needs of the MEMS. Proposed countermeasures are ESD event monitor with electrostatic voltage using a single antenna. Grounding measurement that designed to ignore high-frequency components and measure only the required parameter. These two will help front-end engineer to qualify tools and identify critical process and make the electrostatic issues manageable. Furthermore, the electrostatic field can also be minimized by sub-1 volt ionizer controller that discard initial imbalance, short-term and long-term drift. This brings the balance from 25 volt to sub-1 volt within few second to prevent charge built up in MEMS wafer handling process.
Anusorn Chakkaew Wisut Titiroongruang
Electronic Research Center, Faculty of Engineering, King Mongkuts Institute of Technology Ladkraban Electronic Research Center, Faculty of Engineering, King Mongkuts Institute of Technology Ladkraban
国际会议
China Semiconductor Technology International Conference 2010(中国国际半导体技术大会 CSTIC)
上海
英文
897-901
2010-03-18（万方平台首次上网日期，不代表论文的发表时间）