Wet Etching Technology for Semiconductor and Solar Silicon Manufacturing: Part 1 - Fundamentals
Wet etching is an important step in the manufacturing of semiconductor and solar wafers and for the production of MEMS devices. While it has been replaced by the more precise dry etching technology in advanced semiconductor device fabrication, it still plays an important role in the manufacture of the silicon substrate itself. It is also used for providing stress relief and surface texturing of solar wafers in high volume. The fundamentals of wet etching silicon for semiconductor and solar applications will be reviewed. Different classes of etchants: isotropic and anisotropic: acid and alkaline will be summarized. Key features and attributes for these different etchants will be presented to give the rationale for the use of a particular etchant for a specific application.
Henry F. Erk
Polysilicon and Quantitative Silicon Research Department, Corporate Technology, MEMC Electronic Materials, Inc., 501 Pearl Drive, St. Peters, MO 63376, USA
国际会议
China Semiconductor Technology International Conference 2010(中国国际半导体技术大会 CSTIC)
上海
英文
1061-1071
2010-03-18（万方平台首次上网日期，不代表论文的发表时间）