Parameters optimization of laser processing CVD diamond film based on FEM simulation
Chemical vapor deposited (CVD) diamond film has a series of outstanding properties． However，it can not be easily machined by conventional technologies available currently for its high hardness and stability．Laser processing diamond film method can be an efficient way to process diamond film because of its high energy density．The mechanisms of laser processing diamond film are thermal oxidation．graphitization and evaporative ablation ofgraphite．Temperature distilbution iS of great importance to understand these complex phenomena taking place during the process because different temperatures lead to different physical and chemical changes of diamond．In this paper，the finite element method(FEM)software ANSYS is applied to calculate the temperature distilbution． The relation between etching depth and laser machining parameters(1aser power and scanning speed) is presented．The proper parameter ranges of laser power and scanning speed for a cenaln etching depth is also investigated with this method．
CVD diamond film temperature distribution FEM laser processing
X.J.Wu F.Xu D.W.Zuo W.Z.Lu M.Wang
College of Mechanical and Electrical Engineering,NUAA,Nanjing,210016,China
国际会议
常州
英文
26-29
2009-11-19（万方平台首次上网日期，不代表论文的发表时间）